ORTUS 1100

ORTUS 1100

Substrate holder: Dome ø995 mm, Planetary 4x ø387 mm. Automatic Optical Monitoring. 2xE-gun, 2XResistance evap., RF Plasma Assist Source.

For production companies in the need of higher production capacities.
Suitable for coatings on 3D shaped substrates.

For detailed information about our ORTUS PIAD coater portfolio and its coating capabilities please download the ORTUS CATALOGUE.

Configuration options:

1. Substrate holder

  size loading cap. of 1"
for reff.
Thickness U% for all loading area Max single substrate size
Dome type ø995 mm 576 ±2% 380 mm
Planetary 4 x ø387 mm 416 ±1% 387 mm


2. Technological devices

     - Electron Beam Evaporation (EBE)
          3 different sizes EV M-6, EV M-8, EV M-10
          Customized crucibles, 1 ... 12 pockets
          Max. quantity : 2 pcs

     - Cleaning and Assistance sources
          Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
          Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)
          Max. quantity : 1 pcs

     - Resistance evaporation source
          Max. quantity : 2 pcs together with 2 EBE

3. Coating process control

     - Rate and thickness control system (quartz control)

     - Optical process monitoring system OCP
          OCP Singlewave for monochromatic monitoring

4. Accessories

     Substrate heating system
          - IR lamps
          - Tubular heater

Exampes of substrate holders for semispherical substrates