Broadband AR Coatings for MWIR (3–5 µm)

broadband-ar-coatings-for-mvir-3–5 µm.avif

Broadband AR Coatings for MWIR (3–5 µm)

Broadband anti-reflective coatings for the mid-wave infrared (MWIR) range, widely used in sensing, imaging, and spectroscopy systems. Material-specific designs are available depending on optical and mechanical requirements.

Compatible substrates include: Silicon (Si), Germanium (Ge), Zinc selenide (ZnSe)

Average reflectance < 0.5 %

Coating Function	AR
Design Wavelength (λ)	3-5um
Angle of Incidence (AOI)	0 - 45 °
Polarization	Unpolarized
Operating Temperature	-40°C to +85°C
Material	Ge
Refractive Index (nd)	3,99735
Clear Aperture	≥ 90% of diameter or custom
Coating on Front Side	AR
Reflectance (R)	Ra < 0.5% , Rmax< 0.85% for AOI 0° ; Ra < 1% , Rmax< 2.4% for AOI 45°
Thermal Stability	–40 °C to +85 °C (no degradation) (MIL-C-48497A, ISO 9022-2)
Humidity Resistance	24 h @ 95% RH, 40 °C (MIL-C-48497A, ISO 9211-3)
Abrasion Resistance	Moderate/severe abrasion (MIL-C-48497A, ISO 9211-4, ASTM D1044)
Adhesion	Tape test, no peeling (MIL-C-48497A, ISO 9211-4, ASTM D3359)
Temperature Cycling	–40 °C to +85 °C, 10 cycles (MIL-STD-810H, ISO 9022-2)
Chemical Resistance	Acetone, IPA, no delamination (MIL-C-48497A, ISO 9022-5, ISO 9211-4)

Broadband Antireflection Coatings for IR

Broadband AR Coatings for LWIR (8–14 µm)

Technology

Plasma Ion Assisted Deposition (PIAD)

Plasma Ion Assisted Deposition (PIAD) is a technology that combines ion/plasma treatment with electron beam evaporation (or other PVD methods) to modify film growing dinamics and to get desired film properties which are impossible to achieve by conventional PVD methods. It is used to deposit conformal optical coatings with high densities on complex surfaces, hard coatings of compound materials, and adherent metal coatings.