Application:
- magnetron type neutralizer is applied as sources of electrons for different type of ion-beam sources;
- inverse cylindrical magnetrons are applied for different kind of processes like deposition onto cylindrical outer surfaces for decorative, wear resistant and other purposes;
- innovative long target-to-substrate optical coating with superior coating uniformity.
Main tasks:
- source of electrons for ions discharge compensation on a substrate for coating defects elimination;
- high-rate deposition on cylindrical outer surfaces;
- long target-to-substrate deposition of high quality optical films.
Technical data:
Parameters | Basic | Options |
Magnetron type | Cylindrical inverse magnetron | |
Working pressure | 0,06 ÷ 2 Pa | |
Target material | graphite |
by request |
Target size | Ø2×3 cm | by request |
Magnetic system | Permanent magnets NdFeB+2xNi | |
Anode | No | magnetized hidden, etc. |
Target cooling |
Indirect | |
Power supply | DC, DC-pulse, MF-AC | RF, HiPIMS |
Specific maximum power DC/DC-pulse/MF-AC | 15 W/cm2 | |
Specific maximum power RF | 3 W/cm2 | |
Target utilization | 15...40% | >45% |
Gas flow (depends on pumping) | 5…50 cm3/min | |
Mean time between maintenance (mtbm) | 56 h | |
Cooling | water | |
Cooling water temperature | 18...25 °C | |
Water pressure | 2..4 bar | |
Water flow | >0,7 l/min/kW | |
Working gas | Ar, O2 and other | |
Working gas purity | 99,99 % | |
Overall dimensions, mm | ø75x8 | |
Weight, kg | 2 |