Planar magnetrons

Magnetron sputtering is a technology for thin films depositing in a vacuum chamber and in a working gas using cathode sputtering of the target material in crossed electric and magnetic fields

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Circular planar magnetrons

Used in vacuum lab and batch equipment with substrate sizes up to 250 mm
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Rectangular planar magnetrons

Used in vacuum installations of periodic and continuous operation with substrate sizes up to 3 meters or more
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