Annular anode layer accelerators

Annular anode layer accelerators

Annular anode layer accelerators

Ion-beam treatment of the surface defined as a certain effect resulting from applying ion beams (of a certain character with defined energy and ions density) to the target object.  
Ions of the working gas are generated within crossed electrical and magnetic fields and their acceleration and energy are resulting from the difference of potentials within anode-cathode. Ions resulting from the working gaz ionization together with drifting electrons within closed magnetic field create an anode layer. Devices comprise such physical principles are called anode layer accelerators.

Application:
Round anode layer accelerators applied in a variety of vacuum systems (as batch as in-line types) within  different technological processes while working with substrates up to 250 mm, like: cleaning, polishing and activation of the surface, precise ion-beam etching, films deposition on the substrate, ion-beam assisting while film deposition. Preliminary ion-beam cleaning is the most effective when applying before the coating deposition in one vacuum cycle.   

Main tasks:
-  cleaning and activation of the surface;
-  precise polishing;
- deposition of functional thin films of high density: protective, dielectric, diamond-like, complicated layers compositions from variety of materials.

Technical data:

Parameters Basic Options
Source type accelerator with anode layer
Working pressure 0,009 ÷ 0,15Pa
Target material any
Aperture diameter Ø25, 150, 200 by request
Target diameter Ø50,100,150, 200 by request
Magnetic system Permanent magnets NdFeB+2xNi
Gas distributor Yes
Cooling Indirect Direct
Anode voltage 0,8 ÷ 2,5 kV 0,8 ÷ 5 kV
Mean ion energy 0,35 ÷ 1,5keV 0,35 ÷ 3keV
Current density, mA/cm slit length < 2,1mA/cm < 4,2mA/cm
Gas flow (depends on slit length) 5…750 cm3/min
Mean time between maintenance (mtbm) 120 h
Cooling water
Cooling water temperature 18...25 °C
Water pressure 2..4 bar
Water flow >0,7 l/min/kW
Working gas Ar, O2 and other
Working gas purity 99,99 %