LIDIZ 700

RF IBS for sputtering and assistance, Automatic Optical Monitoring, Multiple choice of substrate holder (single disk, planetary, High speed), Load-lock

The I-Photonics IBS coater LIDIZ 700 is designed to produce cutting-edge optical interference coatings as band pass filters, multispectral filters, beam splitters and ultra low-loss laser mirrors.

With its configurable options on substrate holders, its load-lock system and its unique fully automated high precision optical monitoring system LIDIZ can be configured for different needs to fully provide all advantages of IBS technology as high film purity, the most stable deposition rate at lowest optical losses.

For coating examples and detail information about LIDIZ please download the LIDIZ CATALOGUE.

Installation area	3540×1840×2000 mm (L×W×H)
Equipment weight	4500 kg
Sputtering source	RF Grid IBS with RF neutralizer
Assistance source	RF Grid IBS with RF neutralizer
Substrate Holder and coating area	Single disk Ø320 mm (area 800 cm2) Planetary 4x Ø 210 mm (area 1380 cm2) and planetary 3×Ø320 mm (area 2400 cm2)
Load-lock	For Single disk substrate holder
Coating uniformity	≤±0.25% for planetary 4x Ø 210 mm ≤±0.5% for single disk Ø320 mm ≤±0.5% for planetary 3×Ø320 mm (area 2400 cm2)
Process monitoring system	Automatic optical monitoring system OCP: OCP Broadband, OCP Singlewave, OCP Duo (Broadband and Singlewave 2 in 1)
Substrate materials	glass ceramics, chromatic and achromatic optical glass, quartz, potassium fluoride, sapphire, etc.
Number of targets, max.	4 pcs
Sputtering targets	Ti, Ta, Nb, Zr, Hf, AI, Si, SiO2 etc.
Coating rate	Up to 5 Å /sec (material dependent )
Substrate temperature in the process (without heater)	<100 оС
Substrate heating system temperature	<250 оС
Substrate heating uniformity	± 2 оС
Ultimate pressure	2E-5 Pa
Time to reach Ultimate pressure	8 hours
Process start pressure	8E-4 Pa
Time to reach process start pressure	30 min (without load-lock) 15 min (with load-lock)
Pumping system	Dry mechanical pump & cryogenic pump Turbo molecular pump (optional)

LIDIZ platform

LIDIZ 1100

RF IBS for sputtering and assistance,
Automatic Optical Monitoring,
Increased Throughput

OEM components

OCP Broadband

Deposition process monitoring via broadband spectral measurements and analysis

OCP Singlewave

Deposition process monitoring at the selected wavelengths

RF IBS

RF-Plasma sources / Gridded ion beam sources flow

Technology

Ion Beam Sputtering (IBS)

Ion Beam Sputtering (IBS) or Ion Beam Deposition (IBD) is a kind of Physical Vapor Deposition (PVD) technology that uses ion source to bombard targets for physically removing material from the target which is deposited on the substrate surface. The main advantage of IBS is a possibility to deposit very dense and high quality thin films with extremely high thickness precision and stability compared to other PVD technologies.