Enlarged version of compact ORTUS 700 that is aimed to provide possibility to work with bigger substrates.
Configuration options:
1. Substrate holder
| size | loading cap. of 1" for reff. |
Thickness U% for all loading area | Max single substrate size | |
| Dome type | ø800 mm | 356 | ±2% | 300 mm |
| Planetary | 4 x ø327 mm | 284 | ±1% | 327 mm |
2. Technological devices
- Electron Beam Evaporation (EBE)
- 3 different sizes EV M-6, EV M-8, EV M-10
- Customized crucibles, 1 ... 12 pockets
- Max. quantity : 2 pcs
- Cleaning and Assistance sources
- End-Hall ion source with Ion Current Density up to 1 mA/cm^2
- Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
- Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)
- Max. quantity : 1 pcs
- Resistance evaporation source
- Max. quantity : 1 pcs together with 2 EBE
3. Coating process control
- Rate and thickness control system (quartz control)
- Optical process monitoring system OCP
- OCP Singlewave for monochromatic monitoring
4. Accessories
- Substrate heating system
- IR lamps
- Tubular heater
