Enlarged version of compact ORTUS 700 that is aimed to provide possibility to work with bigger substrates.
For detailed information about our ORTUS PIAD coater portfolio and its coating capabilities please download the ORTUS CATALOGUE.
Configuration options:
1. Substrate holder
size | loading cap. of 1" for reff. |
Thickness U% for all loading area | Max single substrate size | |
Dome type | ø800 mm | 356 | ±2% | 300 mm |
Planetary | 4 x ø327 mm | 284 | ±1% | 327 mm |
2. Technological devices
- Electron Beam Evaporation (EBE)
3 different sizes EV M-6, EV M-8, EV M-10
Customized crucibles, 1 ... 12 pockets
Max. quantity : 2 pcs
- Cleaning and Assistance sources
End-Hall ion source with Ion Current Density up to 1 mA/cm^2
Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)
Max. quantity : 1 pcs
- Resistance evaporation source
Max. quantity : 1 pcs together with 2 EBE
3. Coating process control
- Rate and thickness control system (quartz control)
- Optical process monitoring system OCP
OCP Singlewave for monochromatic monitoring
4. Accessories
Substrate heating system
- IR lamps
- Tubular heater