LIDIZ 1100

RF IBS for sputtering and assistance, Automatic Optical Monitoring, Increased Throughput

I-Photonics IBS coater LIDIZ 1100 is designed to produce the highest quality optical interference coatings with increased troughput.

For coating examples and detail information about LIDIZ please download the LIDIZ CATALOGUE.

With all advantages of IBS technology it is intended to be used in:
Laser optics with low optical loss
   High power lasers
   Laser gyroscope
   Various AR/HR and filters for laser application
Internet of things (IoT)
Light Identification Detection and Ranging (LIDAR)
Medical equipment and Measurement devices
   Beam splitters
   Band pass filters
   Edge filters
   Notch filters.

For coating examples and detail information about LIDIZ please download the LIDIZ CATALOGUE.

Installation area	3490×2730×2460 mm (L×W×H)
Equipment weight	5500 kg
Sputtering source	RF Grid IBS with RF neutralizer
Assistance source	RF Grid IBS with RF neutralizer
Substrate Holder and coating area	Single disk Ø440 mm (area 1520 cm2) Planetary 7x Ø 210 mm (area 2420 cm2) Other planetary by request
Coating uniformity	≤±0.25% planetary 7x Ø 210 mm ≤±0.5% for single disk Ø440 mm
Process monitoring system	Automatic optical monitoring system OCP: OCP Broadband, OCP Singlewave, OCP Duo (Broadband and Singlewave 2 in 1)
Substrate materials	glass ceramics, chromatic and achromatic optical glass, quartz, potassium fluoride, sapphire, etc.
Number of targets, max.	4 pcs
Sputtering targets	Ti, Ta, Nb, Zr, Hf, AI, Si, SiO2 etc.
Coating rate	Up to 4 Å /sec (material dependent )
Substrate temperature in the process (without heater)	<100 оС
Substrate heating system temperature	<250 оС
Substrate heating uniformity	± 2 оС
Ultimate pressure	5E-5 Pa
Time to reach Ultimate pressure	12 hours
Process start pressure	8E-4 Pa
Time to reach process start pressure	40 min
Pumping system	Dry mechanical pump & cryogenic pump Turbo molecular pump (optional)

LIDIZ platform

LIDIZ 700

RF IBS for sputtering and assistance,
Automatic Optical Monitoring,
Multiple choice of substrate holder (single disk, planetary, High speed),
Load-lock

OEM components

OCP Broadband

Deposition process monitoring via broadband spectral measurements and analysis

OCP Singlewave

Deposition process monitoring at the selected wavelengths

RF IBS

RF-Plasma sources / Gridded ion beam sources flow

Technology

Ion Beam Sputtering (IBS)

Ion Beam Sputtering (IBS) or Ion Beam Deposition (IBD) is a kind of Physical Vapor Deposition (PVD) technology that uses ion source to bombard targets for physically removing material from the target which is deposited on the substrate surface. The main advantage of IBS is a possibility to deposit very dense and high quality thin films with extremely high thickness precision and stability compared to other PVD technologies.