Magnetron sputtering is a technology for thin films depositing in a vacuum chamber and in a working gas using cathode sputtering of the target material in crossed electric and magnetic fields
Cylindrical Magnetrons
Cylindrical rotary magnetrons
Used in a vacuum equipment of periodic and continuous operation with substrate sizes up to 3 meters or more
Cylindrical stationary magnetrons
Used in vacuum installations of periodic operation with substrate sizes up to 3 meters or more