ORTUS 700

Substrate holder: Dome ø620 mm, Planetary 3x ø250 mm. Automatic Optical Monitoring. 2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.

The most compact PIAD coater provides all flexibility of ORTUS platform with options in technologycal devices, substrate holders, process control and accessories.
With dome diameter of 620 mm and possibility to install other substrate holders it is optimized for R&D and small scale production.

For detailed information about our ORTUS IAD coater portfolio and its coating capabilities please download the ORTUS CATALOGUE.

Configuration options:

1. Substrate holder

	size	loading cap. of 1" for reff.	Thickness U% for all loading area	Max single substrate size
Dome type	ø620 mm	228	±1.5%	220 mm
Planetary	3 x ø250 mm	132	±1%	250 mm

2. Technological devices

- Electron Beam Evaporation (EBE)
3 different sizes EV M-6, EV M-8, EV M-10
Customized crucibles, 1 ... 12 pockets
Max. quantity : 2 pcs

- Cleaning and Assistance sources
End-Hall ion source with Ion Current Density up to 1 mA/cm^2
Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)
Max. quantity : 1 pcs

- Resistance evaporation source
Max. quantity : 1 pcs together with 2 EBE

3. Coating process control

- Rate and thickness control system (quartz control)

- Optical process monitoring system OCP
OCP Singlewave for monochromatic monitoring

4. Accessories

Substrate heating system

- IR lamps
- Tubular heater

ORTUS platform

ORTUS 900

Substrate holder:
Dome ø800 mm,
Planetary 4x ø327 mm.
Automatic Optical Monitoring.
2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.

ORTUS 1100

Substrate holder:
Dome ø995 mm,
Planetary 4x ø387 mm.
Automatic Optical Monitoring.
2xE-gun, 2XResistance evap., RF Plasma Assist Source.

ORTUS 1500

Substrate holder:
Dome ø1390 mm,
Planetary 4x ø590 mm.
Automatic Optical Monitoring.
2xE-gun, 2xResistance evap., RF Plasma Assist Source.

OEM components

OCP Singlewave

Deposition process monitoring at the selected wavelengths

Linear anode layer accelerators

EHS-50 (End hall source)

End hall source

Technology

Plasma Ion Assisted Deposition (PIAD)

Plasma Ion Assisted Deposition (PIAD) is a technology that combines ion/plasma treatment with electron beam evaporation (or other PVD methods) to modify film growing dinamics and to get desired film properties which are impossible to achieve by conventional PVD methods. It is used to deposit conformal optical coatings with high densities on complex surfaces, hard coatings of compound materials, and adherent metal coatings.