![Light Convergence O2O EXPO 2024](/uploads/news_preview/Light Convergence Expo 2024.png)
Designing and manufacturing of vacuum coating equipment for: optoelectronics, microelectronics,
photovoltaic, thermal processing in vacuum.
Vacuum Coating Systems
I-Photonics key areas in equipment development Magnetron Sputtering, Ion-beam Sputtering and Cleaning, Electron-beam evaporation based with Plasma Ion-Assisted Deposition (PIAD), PECVD, Diamond-like carbon (DLC) coatings.
![](/uploads/main/Meridian PARMS magnetron sputtering main page.png)
Thin-film Coating
The accumulated experience of our team in process integration and the methodology of thin film coating has helped I-Photonics to become specialized to provide own “in house” coating services as well.
![](/uploads/main/Thin-film coating main page.png)
Our Products
![ORTUS 700](/uploads/product/Ortus 700 Ion Beam Assisted Deposition system IBAD.png)
ORTUS 700
Substrate holder:
Dome ø620 mm,
Planetary 3x ø250 mm.
Automatic Optical Monitoring.
2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.
Dome ø620 mm,
Planetary 3x ø250 mm.
Automatic Optical Monitoring.
2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.
![ORTUS 900](/uploads/product/Ortus 900 Ion Beam Assisted Deposition system IBAD.png)
ORTUS 900
Substrate holder:
Dome ø800 mm,
Planetary 4x ø327 mm.
Automatic Optical Monitoring.
2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.
Dome ø800 mm,
Planetary 4x ø327 mm.
Automatic Optical Monitoring.
2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.
![ORTUS 1100](/uploads/product/Ortus 1100 Ion Beam Assisted Deposition system IBAD.png)
ORTUS 1100
Substrate holder:
Dome ø995 mm,
Planetary 4x ø387 mm.
Automatic Optical Monitoring.
2xE-gun, 2XResistance evap., RF Plasma Assist Source.
Dome ø995 mm,
Planetary 4x ø387 mm.
Automatic Optical Monitoring.
2xE-gun, 2XResistance evap., RF Plasma Assist Source.
![ORTUS 1500](/uploads/product/Ortus 1500 Ion Beam Assisted Deposition system IBAD.png)
ORTUS 1500
Substrate holder:
Dome ø1390 mm,
Planetary 4x ø590 mm.
Automatic Optical Monitoring.
2xE-gun, 2xResistance evap., RF Plasma Assist Source.
Dome ø1390 mm,
Planetary 4x ø590 mm.
Automatic Optical Monitoring.
2xE-gun, 2xResistance evap., RF Plasma Assist Source.
![LIDIZ 700](/uploads/product/Lidiz 700 Ion Beam Sputtering system IBS.png)
LIDIZ 700
RF IBS for sputtering and assistance,
Automatic Optical Monitoring,
Multiple choice of substrate holder (single disk, planetary, High speed),
Load-lock
Automatic Optical Monitoring,
Multiple choice of substrate holder (single disk, planetary, High speed),
Load-lock
![Rectangular planar magnetrons](/uploads/product/Rectangular planar magnetrons.png)
Rectangular planar magnetrons
Used in vacuum installations of periodic and continuous operation with substrate sizes up to 3 meters or more
![Cylindrical rotary magnetrons](/uploads/product/Cylindrical rotary magnetrons.png)
Cylindrical rotary magnetrons
Used in a vacuum equipment of periodic and continuous operation with substrate sizes up to 3 meters or more
![Cylindrical stationary magnetrons](/uploads/product/Cylindrical stationary magnetrons.png)
Cylindrical stationary magnetrons
Used in vacuum installations of periodic operation with substrate sizes up to 3 meters or more
![Multi-zone filters](/uploads/product_category/Multi-zone filters.png)
Multi-zone filters
Several filters combined on the same substrate, but separated into separate zones
![Single and multi-wavelength antireflection coating](/uploads/product_category/Single and multi-wavelength antireflection coating.png)
Single and multi-wavelength antireflection coating
Aperture coatings for one narrow spectral band or several bands