SMART vacuum system is designed for a small-scale production as well as for R&D tasks.

The deposition of coatings is carried out by methods of resistive evaporation and/or magnetron sputtering with preliminary heating of substrates.
An implementation of the system for etching processes and RF plasma cleaning is available as an option.

• Inductively coupled plasma (ICP) source
• Ion-beam cleaning source
• DC-magnetron
• Resistive evaporation system

Maximum substrate diameter, mm 150
Maximum coating thickness uniformity, % ± 2,0
Ultimate residual pressure in the clean, Pa 5х10-4
Coatings control Quartz system for thickness control
Control by time