SMART vacuum system is designed for a small-scale production as well as for R&D tasks.
The deposition of coatings is carried out by methods of resistive evaporation and/or magnetron sputtering with preliminary heating of substrates.
An implementation of the system for etching processes and RF plasma cleaning is available as an option.
• Inductively coupled plasma (ICP) source
• Ion-beam cleaning source
• Resistive evaporation system
|Maximum substrate diameter, mm
|Maximum coating thickness uniformity, %
|Ultimate residual pressure in the clean, Pa
|Quartz system for thickness control
Control by time