BELIZA

Designed for titanium coating on substrates made of metallic materials by electron beam evaporation with simultaneous quartz and optical control of the coating thickness

A specially designed substrate positioning system allows to realize step by step three stages of the technological process in one cycle: degassing, thermal stabilization, coating.

FEATURES:
• Thermal stabilization of the substrate using IR heating system in 200 – 600 °C temperature range
• Pyrometric control of the substrate temperature and molten material drop temperature
• Nitrogen flood type trap to create an area of low pressure in coating zone
• Optional use of a mass spectrometer to measure the spectrum of residual gases
TECHNOLOGICAL DEVICES:
• Electron-beam heater - 1 pc.
• Electron-beam evaporator (4 crucibles) - 1 pc.

Diameter of carousel-type substrate holder (12 sectors), mm	590
Maximum number of substrates with a diameter of 30 mm per load, pcs.	24
Maximum substrate diameter, mm	65
Ultimate residual pressure, Pa	1×10-5
Coating control	Quartz Single-wave automated optical

Customized equipment

IZOLAB

Designed for a small-scale production of thin-film coatings as well as for R&D tasks

CLUSTER

Cluster modular equipment is a combination of magnetron and electron beam deposition of optical coatings in one technological process

ELATO-P

Modular equipment "ELATO" is designed for the deposition and the directional crystallization of amorphous coatings on tape substrates

ALCOR

Alсor equipment is designed for deposition of antireflective and passivating coatings on LED lasers by ion-beam sputtering

SMART

SMART vacuum system is designed for a small-scale production as well as for R&D tasks

IZOTERM

Designed for heat treatment of products from various materials in vacuum and inert gas environment with adjustable speed cooling of products with a gas flow

Technology

Plasma Ion Assisted Deposition (PIAD)

Plasma Ion Assisted Deposition (PIAD) is a technology that combines ion/plasma treatment with electron beam evaporation (or other PVD methods) to modify film growing dinamics and to get desired film properties which are impossible to achieve by conventional PVD methods. It is used to deposit conformal optical coatings with high densities on complex surfaces, hard coatings of compound materials, and adherent metal coatings.