ORTUS platform

PIAD evaporation equipment for VIS, IR optics and Lasers

ORTUS 700

Substrate holder:
Dome ø620 mm,
Planetary 3x ø250 mm.
Automatic Optical Monitoring.
2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.

ORTUS 900

Substrate holder:
Dome ø800 mm,
Planetary 4x ø327 mm.
Automatic Optical Monitoring.
2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.

ORTUS 1100

Substrate holder:
Dome ø995 mm,
Planetary 4x ø387 mm.
Automatic Optical Monitoring.
2xE-gun, 2XResistance evap., RF Plasma Assist Source.

ORTUS 1500

Substrate holder:
Dome ø1390 mm,
Planetary 4x ø590 mm.
Automatic Optical Monitoring.
2xE-gun, 2xResistance evap., RF Plasma Assist Source.

ORTUS is a family of e-beam evaporation coaters based with Plasma Ion-Assisted Deposition (PIAD). For details about Plasma Ion Assisted Deposition please click here.

From the compact sized Ortus 700 up to the largest Ortus 1500 our ORTUS coater portfolio can be configurated with a variety of options needed to produce high density IAD under a stable environment.

Our self-developed fully automated optical monitoring system, OCP Singlewave, enable real-time optimization of optical coating process and designs and provide automation of complex filters coatings at highest accuracy and repeatability. This makes ORTUS a reliable and powerful production tool for both an R&D lab and especially for coating companies in the need of stable high quality production capabilities.

Coatings Applications:
- Visible and Infrared Optics
- Lasers
- Customized application

Thin films made in ORTUS are used in:
- Sensors
- Optical systems for objectives
- Microscopes
- Telescopes
- Laser Optics
- R&D

Our engineering team is always ready to study your requirements and tasks and offer the optimal solution to get exactly what you need.

For details about configuration please see description for each model and contact us.

For detailed information about our ORTUS PIAD coater portfolio and its coating capabilities please download the ORTUS CATALOGUE.

Technology

Plasma Ion Assisted Deposition (PIAD)

Plasma Ion Assisted Deposition (PIAD) is a technology that combines ion/plasma treatment with electron beam evaporation (or other PVD methods) to modify film growing dinamics and to get desired film properties which are impossible to achieve by conventional PVD methods. It is used to deposit conformal optical coatings with high densities on complex surfaces, hard coatings of compound materials, and adherent metal coatings.