Depending on the technological process, ion sources are used for:
1. Ion beam sputtering material
2. Ion-beam assisting in the process of material sputtering by various methods
3. Ion beam cleaning of substrates before coating
4. Surface modifications of substrates to change their properties
All types of ion-beam sources can be made both in a standard version and can be adapted to solve a specific specific task of the Customer, depending on the required characteristics.
Flexibility of technical solutions that allow manufacturing ion sources with the characteristics required for a specific technological process is the main advantage of I-Photonics devices.