Innovating surface treatment with the EHS-50 End-Hall ion-beam source!
Innovating surface treatment with the EHS-50 End-Hall ion-beam source! The EHS-50 delivers high-density, low-energy ion flows, perfect for assisting film deposition processes in optics and microelectronics production. Whether it's gentle ion-beam cleaning, reactive etching, or advanced coatings synthesis, the EHS-50 ensures precision and versatility in R&D and production environments.
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