Ion Beam Sputtering (IBS) or Ion Beam Deposition (IBD) is a kind of Physical Vapor Deposition (PVD) technology that uses ion source to bombard targets for physically removing material from the target which is deposited on the substrate surface. The main advantage of IBS is a possibility to deposit very dense and high quality thin films with extremely high thickness precision and stability compared to other PVD technologies.
The latest developments of IBS is a combination of a gridded RF ion source for sputtering with an RF ion/plasma source for assistance that can be called a Double Ion Beam Sputtering (DIBS). It enhances the classical advantages of IBS with an independent control of the film growing process (microstructure, stoichiometry and stress) and substrate preclean capabilities.
The lowest total optical losses, the exceptional environmental stability and durability, the very high purity, the highest stability of deposition rate and the optical constants make IBS/DIBS the ideal choice for most challenging high-end applications as biomedical, high power lasers, telecom, aerospace and airplanes industries.
Additional levels of control can be achieved with integration of optical monitoring to observe the optical deposition process and adjust the process parameters in real-time.
Advantages of films coated by IBS/DIBS:
- high dencity (near bulk-like material)
- low absorption
- low scatering (low roughness)
- high uniformity
- stable optical constants and deposition rate
- excellent purity
- excellent adhesion
Compared to other PVD methods IBS/DIBS has lower throughput's and higher costs but exceptional film performances which cannot be reached by other deposition methods.
The I-Photonics knowledge roots start from IBS technology when R&D cooperations with Nobel Laureate J. Alferov in 1970's prepared the scientific basement for the future realization of industrial coating equipment. Having made years of research and developing different types of Ion Sources the I-Photonics team started IBS vacuum coaters manufacturing in 1998 based on DC Ion Sources (accelerator with anode layer).
At present years of experience in IBS coating are realized in the LIDIZ IBS coater lines that combine RF gridded sputtering ion sources with RF neutralizers, RF ion/plasma assistance sources and fully automated optical monitoring system OCP Broad Band/Single Wave for exceptional precision and reliability.
|IBS/DIBS coaters from 700 to 1100 mm chamber size with RF grided ion source, RF assistance, planetary or single disk substrate holder, optical monitor I-Photonics OCP|