For production companies in the need of higher production capacities.
Suitable for coatings on 3D shaped substrates.
For detailed information about our ORTUS IAD coater portfolio and its coating capabilities please download the ORTUS CATALOGUE.
Configuration options:
1. Substrate holder
| size | loading cap. of 1" for reff. |
Thickness U% for all loading area | Max single substrate size | |
| Dome type | ø995 mm | 576 | ±2% | 380 mm |
| Planetary | 4 x ø387 mm | 416 | ±1% | 387 mm |
2. Technological devices
- Electron Beam Evaporation (EBE)
3 different sizes EV M-6, EV M-8, EV M-10
Customized crucibles, 1 ... 12 pockets
Max. quantity : 2 pcs
- Cleaning and Assistance sources
Luch: Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
Copra: RF ion source (Ion Current Density up to 2.5 mA/cm^2)
Max. quantity : 1 pcs
- Resistance evaporation source
Max. quantity : 2 pcs together with 2 EBE
3. Coating process control
- Rate and thickness control system (quartz control)
- Optical process control system OCP
OCP Broad Band for spectral control
OCP Single Wave for monochromatic control
4. Accessories
Substrate heating system
- IR lamps
- Tubular heater
Exampes of substrate holders for semispherical substrates
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